The mask aligner UV-KUB 3 is the first mask alignment system equipped with a UV-LED light source, that provide an unrivalled collimation and homogeneous exposure, on the international market.
Compact, easy to use and efficient, the mask alignment system UV-KUB 3 allows alignment up to 7″ photolithography mask with substrates up to 6″ in a cube volume of 48cm size.
Thanks to its removable photomask holder, the handling of fragile mask is considerably reduced: you can change the substrate as often as you want without touching the photomask.
Compatible with all standard photoresists: AZ, Shipley, SU8 and K-CL
A new approach of masking
The new generation of mask aligner UV-KUB 3 is particularly suited for the production, through soft lithography, of microfluidic chip, integrated optical circuits, microelectronics, MEMS, semiconductor technology and other.
Fully secure thanks to its dust-proof hood, this equipment is the only solution on the market that democratizes precision photolithography without requiring a cleanroom type environment.
Advantages of the UV-LED exposure technology:
Illumination source devoid of undesirable thermal effects
Perfectly monochromatic
Lifetime of the LEDs > 10 000h: no particular maintenance needed.
UV-KUB 3 Features and Benefits
Resolution and alignment precision
Its design makes possible the realization of microstructures below 1 µm over the entire 4" or 6" work surface with an alignment precision of less than 1 µm.
Removable photomask holder
The photomask holder is removable: you can change the substrate as often as you want without touching the photomask. It allows to save a lot of time in production mode and thus, improve the efficiency of the automatic prealignment function.
Low cost equipment
UV-KUB 3 is the less expensive high resolution mask aligner offered in the international market place.
Compact mask alignment system
Beyond its size reduced to a minimum, its internal supporting structure dispenses the need for anti-vibration table, combined with low power consumption, the UV-KUB 3 is the ideal tool to control the operating costs.
User-friendly and efficient
With the UV-KUB 3 make precision mask alignments of less than 1 µm in few minutes with the ergonomic control joypad or with the help of the dynamic and intuitive tactile interface.
mask aligner UV-KUB 3, 6 inches version, is perfectly suited for:
semiconductor technology
microfluidics lab on a chip fabrication
New generation of UV-LED mask aligner
High quality collimated and homogeneous exposure
Thanks to a divergence angle less than 2°, you can reach resolutions down to micrometre scale without needing a vacuum mode.
It is thus possible to work on thick layers (several hundreds of microns) with a perfect rendering of the edges, with no roughness. This allows to reach 10×100 aspect ratio.
join the success
Don’t just take our word for it
As I was satisfied of the UV-KUB 2 already installed a few years ago at the laboratory, particularly because of its very performing LED technology, I have contacted KLOE to get more information on this new model.
Its price was almost three times lower than other standard mask aligners available on the market.
Acquiring a mask aligner with modest public financing resources was then becoming more accessible. I did my best to be among the first to benefit from this opportunity. After getting funds thanks to strong arguments, and despite a complex tool which needed intensive development work from KLOE, I received in due time, early 2015, the very first serial number. Since then, our mask aligner is perfectly working and is incredibly easy to use, which is together with the price one of its key asset. This equipment now offers us new possibilities and opportunities for the development of microfluidic circuits.”
Performances
- Resolution: 1µm
- Alignment accuracy: 1µm
- Accepted masks size: up to Ø 5″ or Ø 7″ respectively with 4” and 6” version
- Accepted substrate size: Ø 2″ – Ø 4″ – Ø 6″ and 50 x 50mm – 100 x 100mm
- Visualization system resolution: 1,5µm
- Mask/substrate measuring distance resolution: 0,5µm
- θ substrate displacement resolution: 5.10-4°
- XYZ substrate displacement resolution: 0,4µm
- Wavelength: 365nm +/- 5nm
- Power density: 35mW/cm² +/- 10%
- Substrate warm-up during exposure: < 1°C
- Exposure cycle: between 1s and 1h
- Number of programmable cycles: > 100
Specifications
- Dimensions: 475 x 480 x 515mm
- Weight: 55kg / 121lbs
- Displacement control: USB 24 key PAD
- Colour touchscreen: 15.6 inches
- Power supply: 100V/240V – 50Hz/60Hz
- Consumption: 180W
